EUV lithography machine in semiconductor manufacturing highlighting DRAM investment

DRAM Adoption Drives Surge in EUV Lithography Investment, Annual Shipments Projected to Exceed 100 Units by 2028

EUV lithography DRAM investment is accelerating, reshaping semiconductor manufacturing and driving global technological advancements.
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The surge in EUV lithography DRAM investment is reshaping the semiconductor landscape. Recently, the emphasis on extreme ultraviolet (EUV) lithography has witnessed considerable growth, particularly within the DRAM manufacturing sector. The period from 2023 to 2025 experienced a lull due to delayed capital expenditures by major players like Intel and Samsung, coupled with a focus on cost controls among memory makers. However, the industry is now entering a phase of significant expansion, fueled by increasing investments in EUV lithography.

Increased EUV Lithography Adoption

Analysts project that global shipments of EUV lithography systems will achieve an unprecedented high of 65 units by 2026. This momentum is expected to accelerate, with annual shipments projected to exceed 100 units by 2028. The shift towards advanced node architectures in the memory sector acts as a major driving force. EUV lithography simplifies the process by reducing multi-patterning complexity and enhancing wafer throughput, marking a crucial development in this technology's adoption.

Advancements in DRAM and Logic Manufacturing

To achieve finer resolution and lower line-edge roughness, DRAM manufacturers are gearing up to introduce next-generation photoresists like metal oxide resists. Meanwhile, the advanced logic semiconductor sector is pursuing its own unique path by advancing its existing chemically amplified resists to stabilize yield. These efforts are complemented by investments in structural optical upgrades, such as integrating high numerical aperture (High-NA) EUV systems and exploring the use of larger 12-inch photomasks to increase efficiency.

Emerging Technologies in Lithography

An additional aspect of this transformation is the rise of nanoimprint lithography (NIL), which offers a cost-effective alternative for specific patterning layers. As NIL approaches commercial mass production, it further broadens the spectrum of available technologies, enhancing the semiconductor lithography ecosystem.

In summary, the growing EUV lithography DRAM investment reflects a broader expansion within semiconductor manufacturing technologies. As we move through the decade, parallel developments in both DRAM and logic sectors aim to solidify the global position of lithography technologies, promising a comprehensive evolution across the entire industry.